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KMID : 0371819990310020133
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Nuclear Engineering and Technology
1999 Volume.31 No. 2 p.133 ~ p.138
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Etching Reaction of UO₂ with CF₄/O₂ Mixture Gas Plasma
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Kim, Yongsoo
Min, Jinyoung/Bae, Kikwang/Yang, Myungseung
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Abstract
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KEYWORD
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uranium dioxide, etching, plasma, CF₄/O₂ gas, dupic
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